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6.774物理加工:前期处理(麻省理工)

6.774 Physics of Microfabrication: Front End Processing (MIT)
课程网址: http://ocw.mit.edu/courses/electrical-engineering-and-computer-sc...  
主讲教师: Hoyt Judy; Reif L Rafael
开课单位: 麻省理工学院
开课时间: 2004-01-01
课程语种: 英语
中文简介:
本课程面向毕业生,专注于理解“前端”的基本原则。用于制造硅集成电路器件的工艺。这包括先进的物理模型和主要过程的实际方面,如氧化,扩散,离子注入和外延。其他主题包括:高性能MOS和双极器件,包括超薄栅极氧化物,注入损伤增强扩散,高级计量以及硅锗(SiGe)等新材料。
课程简介: This course is offered to graduates and focuses on understanding the fundamental principles of the "front-end" processes used in the fabrication of devices for silicon integrated circuits. This includes advanced physical models and practical aspects of major processes, such as oxidation, diffusion, ion implantation, and epitaxy. Other topics covered include: high performance MOS and bipolar devices including ultra-thin gate oxides, implant-damage enhanced diffusion, advanced metrology, and new materials such as Silicon Germanium (SiGe).
关 键 词: 物理模型; 物理加工; 工艺实践; 高性能MOS; 双极器件; 新材料; 先进的计量
课程来源: 麻省理工学院公开课
最后编审: 2020-10-01:yumf
阅读次数: 40